Type: The most popular , production proven model of Desktop, Atmospheric, Manual Load/Unload RTP RTA RTO RTN. ...    More ...

Type: The most popular , production proven model of Desktop, Atmospheric, Manual Load/Unload RTP RTA RTO RTN.  Q and A on RTP equipment.
New Options: Add Double O Ring and/or O2 Sensor/Analyzer for O2 sensitive applications and saving GaAs, InP, GaN, GaInP, SiC and other valuable compound material wafers .
Wafer Size: 2 to 4 inch or 3~6 inch, Silicon wafers. Use 3″/4″/6″ Susceptor or wafer carriers for small samples, compound material (GaAs , InP , GaN , SiC , GaInP , Glass , etc.) wafers and wafers with metal thin film on top during RTP process.
Controller: Allwin21 unique real time precise Advanced PID Control Technology with Fuzzy Logic Learn capability and Chamber Thermal Data. 0.1millisecond Control!
Temperature: Closed-loop temperature control with bare thin 0.010” Dia K type thermocouple (150-840C) and Non-Contact Patented ERP pyrometer (Option,400-1250C) . 0-0.25 second quick response for repeatability and precise control! Typical processes are 400-600C for alloy, 700-950C for titanide, compound materials annealing and 1000-1050C for implant annealing
Lamp Zones: 6 Zones. Bottom and top heating with 21 (1.2KW ea)  Radiation heating lamps. 2400hours-power-on service time! SSR Lamp control instead of  traditional TRIAC control.
Gas Lines: MFCs, 6 lines capability .Typically, Nitrogen (N2), oxygen (O2), argon (Ar), helium (He) , Forming Gases, NH3, N2O2 etc. are used.
Chamber Design: 40-years-proven Heating chamber’s cold-wall design with special scattering gold plating finish ,originated from AG Associates Heatpulse 610.
Installation: Customer-installation design. Local engineer installation is optional.
PowerSum Function: Save valuable compound material wafers.
RTP Main Customers: Link
Free Fast Quote: Link

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